Determination of trace niobium, vanadium and zirconium in low carbon and low titanium ferrosilicon by inductively coupled plasma atomic emission spectrometry
SONG Zu-feng1,2, LU Xiang-dong3, JIA Jiang-xia2, LU Yin2, WANG Xi-wen2, JIA Yun-hai1
1. Central Iron and Steel Research Institute, Beijing 100081, China; 2. Technology Center of Maanshan Iron &Steel Co., Ltd., Maanshan 243000, China; 3. Jiangsu Yonggang Group Co., Ltd., Zhanjiagang 215628, China
Abstract：The sample was dissolved with nitric acid, hydrofluoric acid and perchloric acid fuming. Nb 322.548nm, V 310.230nm and Zr 319.418nm were selected as the analytical lines. The standard solution series were prepared by matrix matching method to plot the calibration curve and eliminate the influence of matrix effect. The simultaneous determination method of niobium, vanadium and zirconium in low carbon and low titanium ferrosilicon by inductively coupled plasma atomic emission spectrometry (ICP-AES) was established. The interference correction tests of coexisting elements showed that the coexisting elements in sample had no influence on the testing elements. The linear correlation coefficients of calibration curves were all higher than 0.9995. The detection limit of niobium, vanadium and zirconium was 0.0006%, 0.0005% and 0.0005%, respectively. The experimental method was applied for the determination of trace niobium, vanadium and zirconium in actual low carbon and low titanium ferrosilicon samples. The relative standard deviations (RSD, n=10) of measured results were between 1.2% and 4.7%. The recoveries were between 98% and 104%. The contents of niobium, vanadium and zirconium in low carbon and low titanium ferrosilicon sample were determined according to the experimental method, and the found results were consistent with those obtained by YB/T 4395-2014, GB/T 223.14-2000 and GB/T 223.30-1994.
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