Application of focused ion beam dual-beam scanning electron microscope in defect and failure analysis of silicon-based chip

LIU Chen; CHEN Zhen; LU Yudong; L Jinhao JIANG Liang; ZHANG Cuiyuan; PAN Jing

doi:10.13228/j.boyuan.issn1000-7571.013164

LIU Chen, CHEN Zhen, LU Yudong, LÜ Jinhao JIANG Liang, ZHANG Cuiyuan, PAN Jing

Metallurgical Analysis ›› 2026, Vol. 46 ›› Issue (1) : 80-86.

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Metallurgical Analysis ›› 2026, Vol. 46 ›› Issue (1) : 80-86. DOI: 10.13228/j.boyuan.issn1000-7571.013164

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Application of focused ion beam dual-beam scanning electron microscope in defect and failure analysis of silicon-based chip

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2026, 46(1): 80-86 https://doi.org/10.13228/j.boyuan.issn1000-7571.013164

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Received	Published
2025-12-01	2026-01-28
Issue Date
2026-05-28

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