Application of focused ion beam in semiconductor device processing and elemental analysis coupled with time-of-flight secondary ion mass spectrometry

WANG Linjun

Metallurgical Analysis ›› 2026, Vol. 46 ›› Issue (1) : 72-79.

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Metallurgical Analysis ›› 2026, Vol. 46 ›› Issue (1) : 72-79. DOI: 10.13228/j.boyuan.issn1000-7571.013162
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Application of focused ion beam in semiconductor device processing and elemental analysis coupled with time-of-flight secondary ion mass spectrometry

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2026, 46(1): 72-79 https://doi.org/10.13228/j.boyuan.issn1000-7571.013162

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