Determination of iron impurity in industrial silicon by inductively coupled plasma atomic emission spectrometry with microwave digestion

ZHAO Jianfeng, LI Weijie, WANG Yueqiang, YANG Yongtao

Metallurgical Analysis ›› 2026, Vol. 46 ›› Issue (3) : 82-87.

PDF(583 KB)
PDF(583 KB)
Metallurgical Analysis ›› 2026, Vol. 46 ›› Issue (3) : 82-87. DOI: 10.13228/j.boyuan.issn1000-7571.012944

Determination of iron impurity in industrial silicon by inductively coupled plasma atomic emission spectrometry with microwave digestion

    {{javascript:window.custom_author_en_index=0;}}
  • {{article.zuoZhe_EN}}
Author information +
History +

HeighLight

{{article.keyPoints_en}}

Abstract

{{article.zhaiyao_en}}

Key words

QR code of this article

Cite this article

EndNote

Ris (Procite)

Bibtex

Download Citations
{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2026, 46(3): 82-87 https://doi.org/10.13228/j.boyuan.issn1000-7571.012944

References

List( Publishing order | Descend order by publishing year | Descend order by cited within ) Chart analysis

References

{{article.reference}}

Funding

RIGHTS & PERMISSIONS

{{article.copyrightStatement_en}}
{{article.copyrightLicense_en}}
PDF(583 KB)

Accesses

Citation

Detail
Sections
Recommended
Copyright © Metallurgical Analysis, All Rights Reserved.
Tel: 010-62182398　
E-mail：yjfx@analysis.org.cn
Powered by Beijing Magtech Co. Ltd,.

/

〈 〉