Determination of trace silicon in high-purity germanium dioxide by inductively coupled plasma atomic emission spectrometry after matrix separation

ZHENG Huarong, FAN Hongjie, XIAO Shijian, XIAO Fang, GU Wenjun, WANG Jia

Metallurgical Analysis ›› 2024, Vol. 44 ›› Issue (2) : 82-86.

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Metallurgical Analysis ›› 2024, Vol. 44 ›› Issue (2) : 82-86. DOI: 10.13228/j.boyuan.issn1000-7571.012214

Determination of trace silicon in high-purity germanium dioxide by inductively coupled plasma atomic emission spectrometry after matrix separation

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2024, 44(2): 82-86 https://doi.org/10.13228/j.boyuan.issn1000-7571.012214

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