辉光放电磁控溅射靶材利用率和刻蚀均匀性方法研究与进展
王永清, 沈懿璇, 万真真, 余兴, 王海舟
Progress in methods to improve the utilization ratio and erosion uniformity of target in glow discharge magnetron sputtering
WANG Yongqing, SHEN Yixuan, WAN Zhenzhen, YU Xing, WANG Haizhou
冶金分析
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2021, (8): 54
-63
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DOI: 10.13228/j.boyuan.issn1000-7571.011324
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