低温加热挥发三氯氢硅-电感耦合等离子体质谱法测定三氯氢硅中痕量砷
钱津旺, 毛智慧, 杨红燕, 张云晖, 陶明
Determination of trace arsenic in trichlorosilane by inductively coupled plasma mass spectrometry after trichlorosilane volatilization via low temperature heating
QIAN Jin-wang, MAO Zhi-hui, YANG Hong-yan, ZHANG Yun-hui, TAO Ming
冶金分析
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2018, (7): 44
-50
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DOI: 10.13228/j.boyuan.issn1000-7571.010310
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