研究了应用电感耦合等离子体质谱法（ICP-MS）测定硅钢中痕量铜和镍的分析方法。采用硝酸分解样品，通过内标校正和基体匹配消除了基体干扰的影响，同时根据测量时存在的质谱干扰情况，选择同位素65Cu和60Ni作为测定元素和通过调节仪器参数使双电荷离子的产率最低，以减少带来的干扰。该方法用于硅钢中痕量铜和镍的测定，所得的结果与ICP-AES法测定结果完全吻合，各元素测定结果的RSD值小于5％,加标回收率为97.3％～100.3％。

A method for the determination trace copper and nickel in silicon steel by inductively coupled plasma mass spectrometry (ICP-MS) was studied. The samples were dissolved in HNO3. The effect of matrix interference was eliminated by internal standard correction and matrix matching. Meanwhile, according to the mass spectral interferences in determination, the isotopes including 65Cu and 60Ni were used as measuring elements. The yield of double-charge ions were minimized by adjusting instrumental parameters to reduce the interferences. The proposed method was applied to the determination of trace copper and nickel in silicon steel. The results were in good agreement with those obtained by ICP-AES, the relative standard deviations (RSD) of elements were less than 5 %, and the recovery rates of standard addition were in the range of 97.3％-100.3％.