Determination of copper, arsenic and silicon in copper matte and copper sinters by inductively coupled plasma atomic emission spectrometry
ZHAO Shu-yun1, WANG Cheng2, GE Yu-wei3, PENG Yang*1
1.College of Chemistry and Chemical Engineering, Xinjiang University, Urumqi 830046, China;2. Xinjiang Entry-Exit Inspection and Quarantine Bureau, Urumqi 830063, China;3. Ganfeng Lithium Industry Co., Ltd., Xinyu 338000, China
Abstract：The content of copper, arsenic and silicon in copper matte and copper sinters were determined by inductively coupled plasma atomic emission spectrometry using 5 % (V/V) hydrochloric acid as medium after the sample was melted in a silver crucible with sodium peroxide and sodium hydroxide. The experiment conditions were discussed, such as analytical spectral lines for elements, sample melting method, determination medium and matrix interference. Under the optimal conditions, the detection limits of copper, arsenic and silicon were 0.03, 0.05 and 0.03 μg/mL, respectively. This method has been applied to the determination of actual samples, and the results were consistent with those obtained by other conventional methods with relative standard deviations (RSD) less than 3% and recoveries of 94%-106%. The proposed method in this study was applicable for the rapid determination of copper, arsenic and silicon in a large amount of copper matte and copper sinters.
