Abstract：A method for the determination trace copper and nickel in silicon steel by inductively coupled plasma mass spectrometry (ICP-MS) was studied. The samples were dissolved in HNO3. The effect of matrix interference was eliminated by internal standard correction and matrix matching. Meanwhile, according to the mass spectral interferences in determination, the isotopes including 65Cu and 60Ni were used as measuring elements. The yield of double-charge ions were minimized by adjusting instrumental parameters to reduce the interferences. The proposed method was applied to the determination of trace copper and nickel in silicon steel. The results were in good agreement with those obtained by ICP-AES, the relative standard deviations (RSD) of elements were less than 5 %, and the recovery rates of standard addition were in the range of 97.3％-100.3％.
李杰*, 李洁, 张穗忠. 电感耦合等离子体质谱法测定硅钢中痕量铜和镍[J]. 冶金分析, 2011, 31(5): 16-19.
LI Jie*, LI Jie, ZHANG Sui-zhong. Determination of trace copper and nickel in silicon steel by inductively coupled plasma mass spectrometry. , 2011, 31(5): 16-19.
