Abstract：The determination of silicon, phosphorus and iron in manganese metal by inductively coupled plasma atomic emission spectrometry (ICP AES) was developed. The samples were decomposed with diluted nitric acid. The Si 251.611 nm, P 178.229 nm and Fe 259.940 nm were used as the analytical lines of silicon, phosphorus and iron. Meanwhile, the matrix effect was studied. By adding equal amount of manganese into calibration curve solution, the matrix effect caused by matrix component was compensated. The recovery test of metal manganese standard sample was conducted with the recovery rates of 98.0 %-100.5 %. This method was applied to determine GSB H42018 and DH7701 manganese metal standard samples. The measurement results were consistent with the certified values, and the relative standard deviations (RSD, n=6) were smaller than 1 %.
李享. 电感耦合等离子体原子发射光谱法测定金属锰中硅磷铁[J]. 冶金分析, 2011, 31(2): 60-62.
LI Xiang. Determination of silicon, phosphorus and iron in manganese metal by inductively coupled plasma atomic emission spectrometry. , 2011, 31(2): 60-62.
