Abstract:The TaNb6 alloy sample was dissolved with mixed hydrofluoric acid, hydrochloric acid and nitric acid. Nb 309.418 nm, Fe 259.940 nm, Cr 267.716 nm, Ni 221.647 nm, Mn 257.610 nm, Ti 336.121 nm, Al 167.076 nm, Cu 224.700 nm, Sn 189.989 nm, Pb 261.418 nm and Zr 339.198 nm were selected as analytical lines. Under the optimal working conditions of instrument, the content of niobium, iron, chromium, nickel, manganese, titanium, aluminum, copper, tin, lead and zirconium in TaNb6 alloy was determined by inductively coupled plasma atomic emission spectrometry (ICP-AES). The determination method of niobium and ten impurity elements in TaNb6 alloy was established. The calibration curves were prepared by matrix matching method to eliminate the influence of matrix effect. The linear correlation coefficients of calibration curves of testing elements were all higher than 0.999 5. The detection limits of elements in proposed method were between 0.000 1 μg/mL and 0.02 μg/mL. The content of niobium, iron, chromium, nickel, manganese, titanium, aluminum, copper, tin, lead and zirconium in TaNb6 sample was determined according to the experimental method. The relative standard deviations (RSD, n=7) were between 0.021% and 0.25%. The found results were consistent with those obtained by national standard method GB/T 15076—2008 (the specified method for the composition analysis of tantalum-niobium alloy).
Mosheim C E.Niobium and tantalum:A reviewof industry statis-tics[J].TIC, 2001,108(4):51-56.
[2]
He Y H, Liaw P K, Lu Y,et al. Effects of processing on the microstructure and mechanical behavior of binary Cr-Ta alloys[J].Materials Science and Engineering: A,2002,329-331:696-702.
[3]
Buckman R W. New applications for tantalum and tantalum alloys[J].JOM, 2000, 52(3):40-41.
李淑兰,任凤莲,陈莉,等.分离基体ICP-AES法测定高纯钽及其氧化物中杂质元素[J].中南工业大学学报:自然科学版,2000,31(3):242-245.LI Shu-lan,REN Feng-lian,CHEN Li,et al.Determination of impurity in high-purity tantalum and its oxide by ICP-AES after tracematrix separation[J]. Journal of Central South University of Technology:Natural Science, 2000, 31(3):242-245.
[6]
陈新坤.电感耦合等离子体光谱法原理和应用[M].2版.天津:南开大学出版社,1987.
[7]
高颂,庞晓辉,王桂军.电感耦合等离子体原子发射光谱法测定高铌钛铝合金中硼硅钨锰[J].冶金分析,2013,33(11):59-62.GAO Song,PANG Xiao-hui,WANG Gui-jun.Determination of boron,silicon,tungsten and manganese in high niobium titanium aluminum alloy by inductively coupled plasma atomic emission spectrometry[J]. Metallurgical Analysis,2013,33(11):59-62.
[8]
杜梅,刘春,王东杰,等.电感耦合等离子体原子发射光谱法测定钕铁硼中钼钨铌锆钛[J].冶金分析,2014,34(3):65-68.DU Mei,LIU Chun,WANG Dong-jie,et al. Determination of molybdenum,tungsten,niobium,zirconium and titanium in NdFeB alloy by inductively coupled plasma atomic emission spectrometry[J].Metallurgical Analysis,2014,34(3):65-68.
[9]
李延超,李来平,张新,等.电感耦合等离子体原子发射光谱法测定碳化钼催化剂中钼[J].冶金分析,2014,34(11):61-64.LI Yan-chao,LI Lai-ping,ZHANG Xin,et al.Determination of molybdenum in molybdenum carbide catalyst by inductively coupled plasma atomic emission spectrometry[J].Metallurgical Analysis,2014,34(3):61-64.
[10]
刘珍,徐淑坤,迟明玉,等.电感耦合等离子体原子发射光谱法测定纯银中痕量碲[J].冶金分析,2007,27(1):32-34.LIU Zhen,XU Shu-kun,CHI Ming-yu,et al.Determination of trace tellurium in pure silver by inductively coupled plasma-atomic emission spectrometry[J].Metallurgical Analysis,2007,27(1):32-34.