Abstract：A direct analysis method of major element (Cr) and minor elements (Si, Mn, P, Cu, Fe, Ti and Ce) in Cr20Ni80 nickel-chromium alloy sputtering target material by inductively coupled plasma atomic emission spectrometry(ICP-AES) was proposed. The sample was dissolved with mixed nitric acid and hydrochloric acid (VHNO3∶VHCl∶VH2O= 65∶200∶735) by heating at low temperature. The spectral lines of Si 251.612 nm, Mn 257.611 nm, P 178.287 nm, Cr 284.984 nm, Cu 324.754 nm, Fe 259.941 nm, Ti 334.941 nm and Ce 418.660 nm were selected as analytical lines. The matrix effect of nickel, chromium and yttrium could be eliminated by matrix matching method. The spectral overlapping interference and non-spectral interference were not obvious. During the determination of major element Cr, the influence of short-time drifting and fluctuation of detection signals on the determination could be overcome by adding internal standard element Y. Eight elements above in four Cr20Ni80 nickel-chromium alloy sputtering target material were determined. The relative standard deviations (RSD) of found results were less than 2%. The Si, Mn, P, Cr, Cu, Fe and Ti in Cr20Ni80 nickel-chromium alloy reference materials were determined, and the results were consistent with the certified values.
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