Determination of silicon in ferro-niobium by inductively coupled plasma atomic emission spectrometry
LI Xiu-hua1, WANG Wen-pin2, HE Yu-tian3, ZHANG Yan-ru3, HAN Jin-feng3
1. Metallurgical Department, Tangshan Vocational College of Science and Technology, Tangshan 063001, China; 2. Tangshan Yi An Mining Equipment Testing and Inspection Co., Ltd., Tangshan 063000; 3. Technical Center of Tangshan Iron and Steel Group, Tangshan 063016 ,China
Abstract： The sample was dissolved with HNO3 and HF at room temperature. The interference of matrix was eliminated by standard addition method. The background was deducted by selecting proper background points in patented analysis software of inductively coupled plasma atomic emission spectrometer, which solved the shortcomings of conventional standard addition method that it could be only used for the analysis of samples with small amounts and the background interference could not be eliminated. The analytical program was written to automatically plot working curve and calculate results. The stability of method was improved by adding yttrium internal standard, realizing the determination of silicon in ferroniobium by standard addition-inductively coupled plasma atomic emission spectrometry (ICP-AES). The RF power, atomizing gas flow and auxiliary gas flow of inductively coupled plasma atomic emission spectrometer were investigated and optimized. The silicon in one ferroniobium sample was determined for 10 times, and the relative standard deviation (RSD) was 2.4 %. The determination results of standard sample were consistent with the certified values.
