Study of phase analysis on tin slurry in tin electroplating solution
SUN Jie1, AN Cheng-qiang1,2, TAN Yong1, YU Xiao-zhong2
1. School of Environmental and Chemical Engineering, Shenyang Ligong University, Shenyang 110159, China; 2. Research Center for Corrosion and Protection of Mental, Northeast University, Shenyang 110004, China
Abstract：The analysis methods, which consisted of scanning electron microscopy (SEM), X-ray diffraction (XRD), Fourier infrared spectrum (FT-IR) and X-ray photoelectron spectroscopy (XPS), were used to characterize the tin slurry produced in the process of Ferrostan continuous electrolytic tin solution. From the results, it was shown that there existed C, O, S and Sn in the tin slurry. Through cleaning by deionized water, the main content of the slurry was tin compound and a small quantity of phenol sulfonate for the compositions of the original electrolyte were dissolved to the water. The XPS narrow scanning spectra showed that the peak of Sn 3d5/2 existed at 486.9 eV, which corresponded to the quadrivalence tin element (SnO2).
孙 杰，安成强，谭 勇，于晓中. 镀锡液锡泥中锡的物相分析[J]. 冶金分析, 2012, 32(10): 56-59.
SUN Jie, AN Cheng-qiang,TAN Yong, YU Xiao-zhong. Study of phase analysis on tin slurry in tin electroplating solution. , 2012, 32(10): 56-59.
［5］庄瑞舫. 电镀锡和可焊性性锡合金发展概况［J］.电镀与涂饰(Electroplating and Finishing), 2000, 19(2): 38-43.
［6］Wan Zhang, Jonas Guebey, Michael Toben. A novel electrolyte for the high speed electrodeposition of bright pure tin at elevated temperatures［J］.Metal Finishing, 2011, 109(1-2): 13-19.
［7］S S Abd El Rehim, A Awad, A El Sayed. Role of halides in the electroplating of tin from the alkaline-stannate bath［J］.Surface and Coatings Technology, 1986, 28(2): 139-150.
［13］ N Sharma, K M Shaju, G V Subba Rao, et al. Anodic behavior and X-ray photoelectron spectroscopy of ternary tin oxides［J］.Journal of Power Sources, 2005, (139): 250-260.
［14］ Z Stryhal, J Pavlik, S Noviak, et al. Investigations of SnO2 thin films prepared by plasma oxidation［J］.Vacuum, 2002, (67): 665-671.
［15］ J Sun, G C Qi, Y Tan, et al. Characterization of chromate conversion film on tinplate substrate by XPS and electrochemistry methods ［J］.Surface and Interface Analysis, 2009, 41 (6): 449-452.
［16］Harcelo J 著，范光杰 译. 弗洛斯坦法电镀锡电解槽中锡泥形成机理的实验室研究［J］.世界钢铁(World Iron and Steel),2006,(1): 31-36.
