Determination of silicon,aluminum,phosphorus,tantalum and titanium in niobium-manganese-iron alloy by inductively coupled plasma atomic emission spectrometry
ZHANG Yan, SHEN Jian
Test, Analysis and Inspection Center, Baoshan Iron & Steel Co., Ltd., Shanghai 200941, China
Abstract：Niobium-manganese-iron alloy is an important material in the process of ironmaking and cast iron. The accurate analysis of impurity elements in niobium-manganese-iron alloy is of great significance for the quality control of ironmaking and cast iron products. In experiments, the sample was dissolved with nitric acid and hydrofluoric acid at 60 ℃. Si 251.611 nm, Al 308.215 nm, P 178.222 nm, Ta 268.517 nm and Ti 336.122 nm were selected as the analytical lines. The contents of silicon, aluminum, phosphorus, tantalum, and titanium in niobium-manganese-iron alloy were determined by inductively coupled plasma atomic emission spectrometry (ICP-AES). The interference correction experiments of coexisting elements indicated that the interference of coexisting elements with the testing elements could be ignored. The linear correlation coefficients of calibration curves for all testing elements were not less than 0.999 8. The limits of detection were between 0.000 2% and 0.001 8%. The proposed method was applied for the determination of silicon, aluminum, phosphorus, tantalum and titanium in niobium-manganese-iron alloy sample.The relative standard deviations (RSD, n=11) of determination results were between 0.53% and 1.7%. The recoveries were between 98% and 102%. The synthetic samples were prepared using certified reference materials of niobium-iron and manganese-iron, which solved the problem that there was no commercial standard sample of niobium-manganese-iron alloy. The found results were consistent with the theoretical values.
