Abstract：High-purity gold targets are widely used in electronic and information industry. The content of impurity elements in target products has high requirements. The use performance of high-purity gold target products will be affected if the content of impurity elements is on the high side. The experimental conditions of glow discharge mass spectrometry (GDMS), including the discharge current, the flow rate of discharge gas (argon) and the pre-sputtering time of sample, were optimized. The measuring isotopes were selected according to the principle of high abundance, with no or little interference. Meanwhile, the possible MS interference was overcome by selecting the resolution. The analysis method of 42 impurity elements in high-purity gold target by GDMS was established. The contents of 42 impurity elements in high-purity gold target sample were determined according to the experimental method. The results showed that the relative standard deviations (RSD) for impurities with mass fraction higher than 100 μg/kg were all less than 10%, and the RSDs for other testing elements were basically less than 46%. Due to the lack of certified reference materials of high-purity gold, the elements with relatively high content (such as Ca, Fe, Pd, Ag, Pt, Cr, Cu and Ni) were also determined by inductively coupled plasma mass spectrometry (ICP-MS) for comparison. The determination results of experimental method were in good agreement with those obtained by inductively coupled plasma mass spectrometry(ICP-MS).
王长华, 王伟华, 墨淑敏, 胡芳菲, 李娜. 辉光放电质谱法测定高纯金靶材中42种杂质元素[J]. 冶金分析, 2021, 41(2): 9-15.
WANG Changhua, WANG Weihua, MO Shumin, HU Fangfei, LI Na. Determination of forty-two impurity elements in high-purity gold target by glow discharge mass spectrometry. , 2021, 41(2): 9-15.
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